ALD features superb step coverage performance. The SEM images show

ALD features superb step coverage performance. The SEM images show

Symmetry July 2023 - Browse Articles

Uwe SCHROEDER, Senior Scientist, Dr., NaMLab GmbH, Dresden, Dielectrics

Wafer-scale fabrication of conformal atomic-layered TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium and H2O precursors - ScienceDirect

Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition

Highly porous cerium oxide prepared via a one-step hard template method as an extremely effective adsorbent for arsenic species removal from water - ScienceDirect

PDF) Atomic Layer Deposition for advanced DRAM applications

Thomas HECHT, Infineon Technologies, Neubiberg

Basic insights into ALD conformality – A closer look at ALD and thin film conformality – Atomic Limits

PDF) Atomic Layer Deposition for advanced DRAM applications