Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)

Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)

Nanomaterials, Free Full-Text

PDF) Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition

Table 4 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

PDF) Stability of SiNx Prepared by Plasma-Enhanced Chemical Vapor Deposition at Low Temperature

PDF) Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition

PDF] Diffusion of Water Molecules in Amorphous Silica

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

Nanomaterials, Free Full-Text

PDF) Rapid Reversible Degradation of Silicon Thin Films by a Treatment in Water

Classification of the Categories of Amorphous Hydrogenated Silicon Oxynitride Films Using Infrared Spectroscopy